SOPRALAB is committed to meeting the R&D’s needs for thin film metrology in microelectronics, in Flat Panel Display Industry as well as in emerging material deposition technologies such as in Chemistry and in Biology. To fulfill this goal, SOPRALAB has focused on providing first a unique set of analysis tools which can be implemented at the same time on the same platform for a complete characterization of thin films. SOPRALAB also proposes tailored equipments for specific applications. SOPRALAB is recognized as the reference measurement in Spectroscopic Ellipsometry. To maintain and boost this position, the company is continuously investing for improving the hardware and the software of its equipment. In the same time a strong application lab provides the necessary help to the customer for measurements conditions and analysis method. By a strategy of licensing from its network of Universities and applied research center, SOPRALAB has already developed advance tools to help the R&D microelectronics centers following the ITRS. In this field SOPRALAB is aggressively looking for new technologies and new applications to bring it to a mature phase. And, as soon as the equipment is related to mass production, SOPRALAB make strategic alliance with larger companies which are able to offer to industrial customers the necessary service and network. 

For its further expansion, SOPRALAB is including new characterization for thin film metrology based on optics and non destructive techniques. To achieve these goals, SOPRALAB was and is actively involved in numerous projects, in MEDEA+ and in the 6th and the 7th PCRD European programs, as well as in French programs (ANR).

In the framework of 7th PCRD, SOPRALAB is involved in a new project entitled NAPOLYNET: Setting up research ­intensive clusters across the EU on characterization of nanostructured polymers.

NaPolyNet is a 36-month project involving 15 partners from 10 European countries; the kick-off meeting took place in Roma in May 2008. The objectives are:
1. to network at regional, national and international level with experts on the characterization of polymer nanostructured materials in the field of packaging, textiles and membranes, bridging the gap between scientific and engineering approaches for the improved understanding of the structure-performance correlation in polymer devices;
2. to facilitate transnational access to important and unique equipment and to train young scientists and SMEs technologists;
3. to harmonize the work necessary for new standards in the field of characterization of polymer nanostructures for packaging, textiles and membranes. NaPolyNet will also focus on latest findings for managing the safety implications of nanostructured polymers surfaces along the life-cycle of those products. For further information, please refer to NAPOLYNET website: www.napolynet.eu 

In the framework of the 6th PCRD, Sopralab is involved in NAPOLYDE : NANO-STRUCTURED POLYMER DEPOSITION PROCESSES FOR MASS PRODUCTION OF INNOVATIVE SYSTEMS FOR ENERGY PRODUCTION & CONTROL AND FOR SMART DEVICES (NMP2-CT-2005-515846).

The NAPOLYDE consortium will develop new technologies for polymer or polymer-like films deposition at nano-scale precision supporting mass production and environmental friendly requirements.
Sopralab is involved in the characterization of the deposited film. Using UV visible by spectroscopic ellipsometry for “on" and “in"-line characterization, SOPRALB is in charge to provide characterization equipments adapted to the manufacturing procedure using wet technologies (Spin on, Solgel, …) as well as dry technologies (CVD, PVD, …).

For more information, refer to Napolyde website: www.napolyde.org

In the framework of MEDEA +, Sopralab is actively participating to:
SILONIS
2T101: Strained silicon-on-insulator substrates for high performance ICs.
The SilOnIS project combines the strengths of the leading European manufacturers in the fields of substrate materials, metrology and devices to develop jointly the fabrication technology for strained SOI wafers. The resulting wafers should be available commercially soon after the end of the project.
For characterization of the strain silicon, SOPRALAB proposes a complementary technique to Raman. Using polarimetry technique, the strained Silicon can be fast and accurately characterized after calibration. This approach is more mass production oriented than Raman technology.
For more information : www.medeaplus.org/web/downloads/profiles/2T101_profile.pdf

HYMNE
2T102 : High yield driven manufacturing excellence in sub-65 nm CMOS.
The primary objective of the HYMNE project is to develop methods, software and hardware that will permit the European IC manufacturing industry to enhance production cycle time and device yield and hence to significantly gain in competitiveness in advanced technology manufacture.This project is oriented in shortening the learning curve of the sub 65 nm node IC’s manufacturing. The material characterization and monitoring is one of the key issues of such a target.
In this project SOPRALAB is working in close collaboration with LETI and the members of Alliance (ST, Philips, Freescale) to assess Ellipsometry Porosimetry technique as a reference for the characterization of Ultra Low K material for the node 45 nm and below. Also to evaluate the need of such a technique in line as well as a faster and mass production oriented complementary technique (Infra Red Speectroscopic Ellipsometry).

For more information , refer to Hymne website: www.hymne.org, or Hymne profile on Medea+ web site : www.medeaplus.org/web/downloads/profiles/2T102_profile.pdf